4.8 Article

High-Performance Flexible Transparent Thin-Film Transistors Using a Hybrid Gate Dielectric and an Amorphous Zinc Indium Tin Oxide Channel

Journal

ADVANCED MATERIALS
Volume 22, Issue 21, Pages 2333-2337

Publisher

WILEY-V C H VERLAG GMBH
DOI: 10.1002/adma.200903761

Keywords

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Funding

  1. NSF at the Northwestern University Materials Research Center [DMR-0520513]
  2. AFOSR [FA9550-08-1-0331]
  3. NSF-NSEC
  4. NSF-MRSEC
  5. Keck Foundation
  6. State of Illinois
  7. Northwestern University

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High-performance flexible transparent thin-film transistors (TFTs) are demonstrated using amorphous zink indium tin oxide (ZITO) transparent oxide conductor electrodes, an amorphous ZITO transparent oxide semiconductor channel, and a vapor-deposited self-assembled nanodielectric (v-SAND) gate insulator. These TFTs exhibit a large field-effect mobility of 110 cm(2)V(-1)s(-1), a current on/off ratio of 10(4), and a low operating voltage of 1.0V, along with very good optical transparency and mechanical flexibility.

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