Sub-15nm Optical Fiber Nanoimprint Lithography: A Parallel, Self-aligned and Portable Approach

We demonstrate the parallel patterning of multiple optical-fiber facets using nanoimprint lithography on a novel platform. A resolution of better than 15 nm is demonstrated and up to 40 optical-fiber facets have been imprinted in parallel. The lithography platform features a self-alignment mechanism that greatly relaxes the mechanical requirements, allowing the demonstration of a compact, portable imprinting-module and the accommodation of non-planar, biological molds. The imprinted fibers are metalized and employed as bi-directional probes for surface-enhanced Raman scattering.