4.8 Article

One-Step Direct-Patterning Template Utilizing Self-Assembly of POSS-Containing Block Copolymers

Journal

ADVANCED MATERIALS
Volume 21, Issue 43, Pages 4334-+

Publisher

WILEY-V C H VERLAG GMBH
DOI: 10.1002/adma.200900518

Keywords

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Funding

  1. Nanoscale Science and Engineering Center [DMR-0425880]
  2. NSF-DMR-CAREER [0449688]
  3. Center of Functional Engineered Nano Architectonics (FENA)
  4. Mitsubishi Chemical Corporation Fund
  5. Division Of Materials Research
  6. Direct For Mathematical & Physical Scien [0449688] Funding Source: National Science Foundation

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We report the self-assembly of organic-inorganic block copolymers (BCP) in thin-films by simple solvent annealing on unmodified substrates. The resulting vertically oriented lamellae and cylinders are converted to a hard silica mask by single-step, highly selective oxygen plasma etching. The size of the resulting nanostructures in the case of cylinders is less than 10 nm.

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