Journal
ADVANCED MATERIALS
Volume 21, Issue 18, Pages 1845-+Publisher
WILEY-BLACKWELL
DOI: 10.1002/adma.200803440
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Funding
- German Federal Ministry for Education and Research BMBF [FKZ 13N9152, 01BD351]
- Deutsche Forschungsgerneinschaft (DFG)
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Highly efficient gas-diffusion barriers based on nanolaminates of alternating Al2O3 and ZrO2 layers grown at 80 degrees C by atomic-layer deposition are presented. Ultralow water-vapor permeation rates are reported, and a dramatic reduction of statistical defects on larger areas was found compared to single Al2O3 layers. This study provides a concept for the encapsulation of organic optoelectronic devices.
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