Journal
ADVANCED MATERIALS
Volume 21, Issue 24, Pages 2530-+Publisher
WILEY-V C H VERLAG GMBH
DOI: 10.1002/adma.200803794
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Patterning of high-mobility semiconducting polymer thin films is essential to prevent undesirable crosstalk in realization of integrated circuits. We present here two simple selective physical delamination methods that allow clean and high-resolution patterning of semiconducting polymers for thin-film transistors, leading to a significant reduction in OFF current while retaining the high field-effect mobilities of the unpatterned polymer films.
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