Journal
ADVANCED MATERIALS
Volume 21, Issue 24, Pages 2540-+Publisher
WILEY-V C H VERLAG GMBH
DOI: 10.1002/adma.200802855
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- Semiconductor Research Corporation
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Self-assembly of a block copolymer into cylindrical and/or perforated lamellar arrays within substrate trenches can be extensively tuned during the solvent-annealing process. Following reactive-ion etching SEM images reveal that the, solvent mixing ratio and the vapor pressure determine the type of array obtained and influence the dimensions of the repeat unit.
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