Journal
ADVANCED MATERIALS
Volume 21, Issue 5, Pages 555-+Publisher
WILEY-V C H VERLAG GMBH
DOI: 10.1002/adma.200702484
Keywords
-
Ask authors/readers for more resources
Inorganic condensing sol-gel films are promising resist materials for nanoimprint lithography. We demonstrate that sequential patterning of these materials can be performed by controlling their condensation state. As a consequence, multilevel inorganic patterns can be obtained by superimposing structures, as show here, where successive stamping of a line pattern leads to two-level square features.
Authors
I am an author on this paper
Click your name to claim this paper and add it to your profile.
Reviews
Recommended
No Data Available