Journal
ADVANCED MATERIALS
Volume 20, Issue 3, Pages 457-+Publisher
WILEY-V C H VERLAG GMBH
DOI: 10.1002/adma.200700956
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Two-dimensional colloidal lithography is successfully applied to the fabrication of novel transparent carbon nanotube networks with controllable film resistance. The method adopted in this study produces ordered network structure with regular voids in the carbon nanotube network film, and results in transparency increases compared with random network structured films, without loss of conductivity.
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