4.8 Article

Formation and surface modification of nanopatterned thiol-ene substrates using Step and Flash Imprint Lithography

Journal

ADVANCED MATERIALS
Volume 20, Issue 17, Pages 3308-+

Publisher

WILEY-V C H VERLAG GMBH
DOI: 10.1002/adma.200800672

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Funding

  1. NSF MRSEC [DMR-0213918]
  2. Division Of Materials Research
  3. Direct For Mathematical & Physical Scien [0820579] Funding Source: National Science Foundation

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Functionalized, thiol-ene nanopatterned materials are fabricated using step and flash imprint lithography (SFIL) and are readily modified with a micropatterned, secondary polymer layer through the unreacted pendant thiols on the surface. Thiol-enes offer versatile chemistry, rapid curing and excellent control over polymer properties using stoichiometry and functionality for both base substrate and attached secondary polymer layer.

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