Single-Photon and Two-Photon Induced Photocleavage for Monolayers of an Alkyltriethoxysilane with a Photoprotected Carboxylic Ester

The photochemical structuring of a polysiloxane monolayer protected with a photocleavable group is shown by femtosecond laser pulses in the near-infrared. These experiments suggest a two-photon induced deprotection process that holds great promise for near-field monolayer photolithography far below the diffraction limit.