4.8 Article

Photoresist-free lithographic patterning of solution-processed nanostructured metal thin films

Journal

ADVANCED MATERIALS
Volume 20, Issue 18, Pages 3457-+

Publisher

WILEY-V C H VERLAG GMBH
DOI: 10.1002/adma.200800157

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Funding

  1. Korean Government (MOEHRD, Basic Research Promotion Fund) [KRF-2006-311-D00586]

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Nanostructured Ag thin films solution-deposited on glass and plastic substrates are patterned by direct exposure to a pulsed Nd:YAG laser without using a photoresist layer. Sharp-edged patterns with a feature size scaled down to ca. 2 mu m are obtainable.

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