Journal
ADVANCED MATERIALS
Volume 20, Issue 8, Pages 1474-+Publisher
WILEY-V C H VERLAG GMBH
DOI: 10.1002/adma.200703102
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A method to fabricate and transfer crystalline ZnO with control over location, orientation, size, and shape is reported. The process uses an oxygen plasma treatment in combination with a photoresist pattern on magnesium-doped GaN substrates to define narrow nucleation regions and attachment points with 100 nanometer scale dimensions. Lateral epitaxial overgrowth follows nucleation to produce single-crystalline ZnO shown in the figure.
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