Epitaxial transition metal oxide nanostructures fabricated by a combination of AFM lithography and molybdenum lift-off

A novel process for the microfabrication of metal oxide nanostructures is developed based on combining thin film deposition at high temperatures with the use of a Mo mask fabricated by atomic force microscopy lithography. The Mo mask is lifted-off using H2O2 solution after deposition of the oxide film. The figure shows nanoscale Fe2.5Mn0.5O4 stripes fabricated by this process.