Journal
ADVANCED MATERIALS
Volume 20, Issue 5, Pages 909-+Publisher
WILEY-V C H VERLAG GMBH
DOI: 10.1002/adma.200700646
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A novel process for the microfabrication of metal oxide nanostructures is developed based on combining thin film deposition at high temperatures with the use of a Mo mask fabricated by atomic force microscopy lithography. The Mo mask is lifted-off using H2O2 solution after deposition of the oxide film. The figure shows nanoscale Fe2.5Mn0.5O4 stripes fabricated by this process.
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