Polyelectrolyte negative resist patterns as templates for the electrostatic assembly of nanoparticles and electroless deposition of metallic films

Electron-beam lithography is used to pattern either cationic polyvinyl N-methyl pyridine or anionic sulfonated polystyrene polymers, that act as negative resists, to produce templates for electroless deposition and the electrostatic assembly of metallic, magnetic, or semiconductor nanoparticles.