The patterning of sub-500 nm inorganic oxide structures

Elastomeric perfluoropolyether molds are applied to pattern arrays of sub-500 nm inorganic oxide features. This versatile soft-lithography technique can be used to pattern a wide range of materials; in this work inorganic oxides including Ti02, Sn02, ZnO, ITO, and BaTi03 are patterned on a variety of substrates with different aspect ratios. An example of Ti02 posts is shown in the figure.