4.8 Article

Highly Versatile and Robust Materials for Soft Imprint Lithography Based on Thiol-ene Click Chemistry

Journal

ADVANCED MATERIALS
Volume 20, Issue 19, Pages 3728-+

Publisher

WILEY-V C H VERLAG GMBH
DOI: 10.1002/adma.200800330

Keywords

-

Funding

  1. NSF [CHE-0514031, DMR-0520415]
  2. Mitsubishi Chemical Center for Advanced Materials (MC-CAM)
  3. Mitsubishi Chemical Group Science and Technology Research Center, Inc.

Ask authors/readers for more resources

As easy as shake and bake, the mixing and photocuring of poly-functional thiols with alkene-functional cross-linkers, via thiol-ene click chemistry, leads to materials with outstanding and tunable characteristics for soft imprint lithography. The materials are cured within 2 minutes at ambient conditions allowing stamps with high aspect ratio and sub-100nm features to be fabricated.

Authors

I am an author on this paper
Click your name to claim this paper and add it to your profile.

Reviews

Primary Rating

4.8
Not enough ratings

Secondary Ratings

Novelty
-
Significance
-
Scientific rigor
-
Rate this paper

Recommended

No Data Available
No Data Available