Journal
ADVANCED FUNCTIONAL MATERIALS
Volume 25, Issue 5, Pages 679-686Publisher
WILEY-V C H VERLAG GMBH
DOI: 10.1002/adfm.201402687
Keywords
atomic layer deposition; morphology; nanoparticles; nanostructures; ultrathin films; vanadium dioxide (VO2)
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Funding
- imec Industrial Affiliate Program
- TEL-imec joint development program on RRAM materials
- FWO
- Marie Curie Reintegration Grant
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Nanoscale morphology of vanadium dioxide (VO2) films can be controlled to realize smooth ultrathin (<10 nm) crystalline films or nanoparticles with atomic layer deposition, opening doors to practical VO2 metal-insulator transition (MIT) nanoelectronics. The precursor combination, the valence of V, and the density for as-deposited VO2 films, as well as the postdeposition crystallization annealing conditions determine whether a continuous thin film or nanoparticle morphology is obtained. It is demonstrated that the films and particles possess both a structural and an electronic transition. The resistivity of ultrathin films changes by more than two orders of magnitude across the MIT, demonstrating their high quality.
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