Journal
ADVANCED FUNCTIONAL MATERIALS
Volume 24, Issue 36, Pages 5679-5686Publisher
WILEY-V C H VERLAG GMBH
DOI: 10.1002/adfm.201401304
Keywords
resistive random access memory (RRAM); memory switching; threshold switching; conductive filaments
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Funding
- Ministry of Science and Technology of China [2010CB934200, 2011CBA00602, 2011AA010401, 2011AA010402]
- NSFC [61221004, 61106119, 61106082, 61334007, 61322408, 61274091]
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Volatile threshold switching (TS) and non-volatile memory switching (MS) are two typical resistive switching (RS) phenomena in oxides, which could form the basis for memory, analog circuits, and neuromorphic applications. Interestingly, TS and MS can be coexistent and converted in a single device under the suitable external excitation. However, the origin of the transition from TS to MS is still unclear due to the lack of direct experimental evidence. Here, conversion between TS and MS induced by conductive filament (CF) morphology in Ag/SiO2/Pt device is directly observed using scanning electron microscopy and high-resolution transmission electron microscopy. The MS mechanism is related to the formation and dissolution of CF consisting of continuous Ag nanocrystals. The TS originates from discontinuous CF with isolated Ag nanocrystals. The results of current-voltage fitting and Kelvin probe force microscopy further indicate that the TS mechanism is related to the modulation of the tunneling barrier between Ag nanocrystals in CF. This work provides clearly experimental evidence to deepen understanding of the mechanism for RS in oxide-electrolyte-based resistive switching memory, contributing to better control of the two RS behaviors to establish high-performance emerging devices.
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