4.8 Article

Photochemical Generation of Light Responsive Surfaces

Journal

ADVANCED FUNCTIONAL MATERIALS
Volume 23, Issue 32, Pages 4011-4019

Publisher

WILEY-V C H VERLAG GMBH
DOI: 10.1002/adfm.201203602

Keywords

grafting; photoligation chemistry; surface patterning; azobenzene; photoresponse

Funding

  1. MINECO, Spain [MAT2011-27978-C02-01]
  2. Fondo Europeo de Desarrollo Regional (FEDER)
  3. Gobierno de Aragon
  4. CSIC
  5. Karlsruhe Institute of Technology (KIT)
  6. German Research Council (DFG)
  7. ministry of science and arts of the state of Baden-Wurttemberg

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The preparation of patterned photoswitchable surfaces by employing the nitrile imine-mediated tetrazole ene cycloaddition (NITEC) photoinduced reaction in the presence of dipolarophiles based on photoresponsive azobenzene moieties is reported. The dipolarophile used is a maleimide carrying either an azobenzene unit or a first generation dendron containing two azobenzene units. X-ray photoelectron spectroscopy (XPS) is employed to analyze the functionalized silicon wafers, while time-of-flight secondary ion mass spectrometry (ToF-SIMS) evidences the spatial control of the functionalization of the surface achieved by using a micropatterned shadow mask. Water contact angle measurements and optical inspection observing the behavior of a water droplet demonstrate the photoinduced change on wettability of the structured functionalized surfaces due to the reversible trans-to-cis isomerization of the azobenzene moities.

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