Journal
ADVANCED FUNCTIONAL MATERIALS
Volume 23, Issue 12, Pages 1597-1602Publisher
WILEY-V C H VERLAG GMBH
DOI: 10.1002/adfm.201201352
Keywords
block copolymer lithography; surface neutralization; ketene mediated crosslinking
Categories
Funding
- National Research Foundation of Korea (NRF)
- Korean Government (MEST) [2012014473]
- Human Resources Development Program of KETEP [20114010203050]
- Korea government Ministry of Knowledge Economy
- Nanoelectronics Research Initiative [1549]
- Microelectronics Advanced Research Corporation (MARCO)
- Focus Center Research Program (FCRP)-Center for Functional Engineered NanoArchitectonics (FENA)
- National Science Foundation (MRSEC Program) [DMR-1121053]
- DOD (NDSEG Fellowship)
- National Research Foundation of Korea [2013-PAL] Funding Source: Korea Institute of Science & Technology Information (KISTI), National Science & Technology Information Service (NTIS)
Ask authors/readers for more resources
Balancing the interfacial interactions between a polymer and substrate is one of the most commonly employed methods to ensure the vertical orientation of nanodomains in block copolymer lithography. Although a number of technologies have been developed to meet this challenge, there remains a need for a universal solution for surface neutralization that combines simple synthesis, fast processing times, generality toward substrate, low density of film defects, and good surface adhesion. The chemistry of ketenes, which combines highly efficient polymer crosslinking through dimerization and surface adhesion through reaction with the substrate, is shown to be well suited to the challenge. The versatile chemistry of ketenes are accessed through the post-polymerization of Meldrum's acid, which can be easily incorporated into copolymers through controlled radical polymerization processes. Further, the Meldrum's acid monomer is synthesized on a large scale in one step without the need for chromatography. Processing times of seconds, low defect density, simple synthetic procedures, and good substrate adhesion make these materials attractive as robust block copolymer neutralization layers.
Authors
I am an author on this paper
Click your name to claim this paper and add it to your profile.
Reviews
Recommended
No Data Available