4.8 Article

Vacuum-Free, Maskless Patterning of Ni Electrodes by Laser Reductive Sintering of NiO Nanoparticle Ink and Its Application to Transparent Conductors

Journal

ACS NANO
Volume 8, Issue 10, Pages 9807-9814

Publisher

AMER CHEMICAL SOC
DOI: 10.1021/nn503383z

Keywords

selective laser reductive sintering; Ni electrode; solution-processable route; NiO nanoparticle ink; touch screen panel; flexible substrate

Funding

  1. King Abdullah University of Science and Technology (KAUST)
  2. SBIR Phase I Grant from the U.S. National Science Foundation [1346088]
  3. Gachon University [GCU-2014-0107]
  4. Directorate For Engineering
  5. Div Of Industrial Innovation & Partnersh [1346088] Funding Source: National Science Foundation

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We introduce a method for direct patterning of Ni electrodes through selective laser direct writing (LDW) of NiO nanoparticle (NP) ink. High-resolution Ni patterns are generated from NiO NP thin films by a vacuum-free, lithography-free, and solution-processable route. In particular, a continuous wave laser is used for the LDW reductive sintering of the metal oxide under ambient conditions with the aid of reducing agents in the ink solvent. Thin (similar to 40 nm) Ni electrodes of glossy metallic surfaces with smooth morphology and excellent edge definition can be fabricated. By applying this method, we demonstrate a high transmittance (>87%), electrically conducting panel for a touch screen panel application. The resistivity of the Ni electrode is less than an order of magnitude higher compared to that of the bulk Ni. Mechanical bending test, tape-pull test, and ultrasonic bath test confirm the robust adhesion of the electrodes on glass and polymer substrates.

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