Journal
ACS NANO
Volume 8, Issue 11, Pages 11770-11777Publisher
AMER CHEMICAL SOC
DOI: 10.1021/nn5053684
Keywords
photoelectrochemical; WO3; nanofiakes; etching; reducing; oxygen vacancy
Categories
Funding
- National Key Basic Research Program of China [2013CB934104]
- Natural Science Foundation of China [21322311, 21473038, 21071033]
- Science and Technology Commission of Shanghai Municipality [14JC1490500]
- Ministry of Education of China [20130071110031]
- Program for Professor of Special Appointment (Eastern Scholar) at Shanghai Institutions of Higher Learning
- Deanship of Scientific Research of King Saud University (IHCRG) [14-102]
- Hui-Chun Chin & Tsung-Dao Lee Chinese Under-graduate Research Endowment
Ask authors/readers for more resources
We developed a postgrowth modification method of two-dimensional WO3 nanoflakes by a simultaneous solution etching and reducing process in a weakly acidic condition. The obtained dual etched and reduced WO3 nanoflakes have a much rougher surface, in which oxygen vacancies are created during the simultaneous etching/reducing process for optimized photoelectrochemical performance. The obtained photoanodes show an enhanced photocurrent density of similar to 1.10 mA/cm(2) at 1.0 V vs Ag/AgCl (similar to 1.23 V vs reversible hydrogen electrode), compared to 0.62 mA/cm(2) of pristine WO3 nanoflakes. The electrochemical impedance spectroscopy measurement and the density functional theory calculation demonstrate that this improved performance of dual etched and reduced WO3 nanoflakes is attributed to the increase of charge carrier density as a result of the synergetic effect of etching and reducing.
Authors
I am an author on this paper
Click your name to claim this paper and add it to your profile.
Reviews
Recommended
No Data Available