4.8 Article

Nanoimprinting Techniques for Large-Area Three-Dimensional Negative Index Metamaterials with Operation in the Visible and Telecom Bands

Journal

ACS NANO
Volume 8, Issue 6, Pages 5535-5542

Publisher

AMER CHEMICAL SOC
DOI: 10.1021/nn5015775

Keywords

nanoimprint lithography; negative index; metamaterials

Funding

  1. Office of Naval Research
  2. United States Department of Energy [DE-AC04-94AL85000]
  3. National Council of Science and Technology (CONACyT)
  4. Secretariat of Public Education (SEP)
  5. Mexican Government

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We report advances in materials, designs, and fabrication schemes for large-area negative index metamaterials (NIMs) in multilayer fishnet layouts that offer negative index behavior at wavelengths into the visible regime. A simple nanoimprinting scheme capable of implementation using standard, widely available tools followed by a subtractive, physical liftoff step provides an enabling route for the fabrication. Computational analysis of reflection and transmission measurements suggests that the resulting structures offer negative index of refraction that spans both the visible wavelength range (529-720 nm) and the telecommunication band (1.35-1.6 mu m). The data reveal that these large (>75 cm(2)) imprinted NIMs have predictable behaviors, good spatial uniformity in properties, and figures of merit as high as 4.3 in the visible range.

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