4.8 Article

Resistive Random Access Memory Enabled by Carbon Nanotube Crossbar Electrodes

Journal

ACS NANO
Volume 7, Issue 6, Pages 5360-5366

Publisher

AMER CHEMICAL SOC
DOI: 10.1021/nn401212p

Keywords

carbon nanotubes; resistive memory; RRAM scaling; crossbar; atomic layer deposition (ALD); aluminum oxide

Funding

  1. MSD Focus Center under the Focus Center Research Program (FCRP), a Semiconductor Research Corporation entity
  2. NSF [09-05175, 10-02026]
  3. Direct For Mathematical & Physical Scien
  4. Division Of Materials Research [0905175] Funding Source: National Science Foundation

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We use single-walled carbon nanotube (CNT) crossbar electrodes to probe sub-5 nm memory domains of thin AlOx films. Both metallic and semiconducting CNTs effectively switch AlOx bits between memory states with high and low resistance. The low-resistance state scales linearly with CNT series resistance down to similar to 10 M Omega, at which point the ON-state resistance of the AlOx filament becomes the limiting factor. Dependence of switching behavior on the number of cross-points suggests a single channel to dominate the overall characteristics in multi-crossbar devices. We demonstrate ON/OFF ratios up to 5 x 10(5) and programming currents of 1 to 100 nA with few-volt set/reset voltages. Remarkably low reset currents enable a switching power of 10-100 nW and estimated switching energy as low as 0.1-10 0 per bit. These results are essential for understanding the ultimate scaling limits of resistive random access memory at single-nanometer bit dimensions.

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