Journal
ACS NANO
Volume 6, Issue 3, Pages 2071-2077Publisher
AMER CHEMICAL SOC
DOI: 10.1021/nn203767s
Keywords
block copolymer; self-assembly; templated self-assembly; nanolithography; line pattern; high throughput
Categories
Funding
- Office of Naval Research (ONR)
- National Science Foundation
- Semiconductor Research Corporation
- UCLA FENA Center
- Samsung
- Division Of Materials Research
- Direct For Mathematical & Physical Scien [1007760] Funding Source: National Science Foundation
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Self-assembly of block copolymer films can generate useful periodic nanopatterns, but the self-assembly needs to be templated to impose long-range order and to control pattern registration with other substrate features. We demonstrate here the fabrication of aligned sub-10-nm line width patterns with a controlled orientation by using lithographically formed post arrays as templates for a 16 kg/mol poly(styrene-block-dimethylsiloxane) (PS-b-PDMS) diblock copolymer. The in-plane orientation of the block copolymer cylinders was controlled by varying the spacing and geometry of the posts, and the results were modeled using 3D self-consistent field theory. This work illustrates how arrays of narrow lines with specific in-plane orientation can be produced, and how the post height and diameter affect the self-assembly.
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