4.8 Article

Large-Area Graphene Films by Simple Solution Casting of Edge-Selectively Functionalized Graphite

Journal

ACS NANO
Volume 5, Issue 6, Pages 4974-4980

Publisher

AMER CHEMICAL SOC
DOI: 10.1021/nn201072m

Keywords

edge-selective functionalization; graphene film; solution processing; annealing; sheet resistance; optical transmittance

Funding

  1. World Class University (WCU)
  2. US-Korea NBIT
  3. National Research Foundation (NRF) of Korea
  4. US Air Force Office of Scientific Research (AFOSR)

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We report edge-selective functionalization of graphite (EFG) for the production of large-area uniform graphene films by simply solution-casting EFG dispersions In dichloromethane on silicon oxide substrates, followed by annealing. The resultant graphene films show ambipolar transport properties with sheet resistances of 0.52-3.11 K Omega/sq at 63-90% optical transmittance. EFG allows solution processing methods for the scalable production of electrically conductive, optically transparent, and mechanically robust flexible graphene films for use in practice.

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