Journal
ACS NANO
Volume 5, Issue 3, Pages 1860-1864Publisher
AMER CHEMICAL SOC
DOI: 10.1021/nn103361d
Keywords
antireflection; block copolymers; nanofabrication; subwavelength gratings; broad-band
Categories
Funding
- Division Of Materials Research
- Direct For Mathematical & Physical Scien [832760] Funding Source: National Science Foundation
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We present a simple and cost-effective Method for the fabrication of antireflective surfaces by self assembly of block copolymers and subsequent plasma etching. The block copolymers create randomly oriented periodic patterns, which are further transferred into fused silica substrates. The reflection on the patterned fused silica surface Is reduced to well below 1% in the ultraviolet visible, and near infrared ranges by exploiting subwavelength nanostructures with periodicities down to 48 nm. We show that by choosing the appropriate block copolymers and pattern transfer, parameters the optical properties-of the antireflective surface can be easily tuned, and the spectral measurements verify a significant reduction of the reflectivity by a factor of 10. The experiments, confirmed with simulations based on rigorous diffraction theory, also show that the tapered shape of. the nanostructures gives rise to a graded index surface, resulting In a broad band antireflective behavior.
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