Fast Assembly of Ordered Block Copolymer Nanostructures through Microwave Annealing

Block copolymer self assembly is an innovative technology capable of patterning technologically relevant substrates with nanoscale precision for a range of applications Train integrated circuit fabrication to tissue block copolymer structures The technique Involves the usage of a commercial microwave reactor to anneal block copolymer films in the presence of appropriate solvents, and we explore the effect of various parameters over the polymer assembly speed and defect density The approach Is applied to,the commonly used poly(styrene)-b poly(methyl methacrylate) (PS b PMMA) and poly(styrene) b-poly(2 vinylpyridine) (PS-b-P2VP) families of block copolymers; and it is found that the substrate resistivity, solvent environment, and anneal temperature all critically influence the self assembly process For selected systems, highly ordered patterns Were achieved In lens than 3 min In addition, we establish the technique with directed assembly by graphoepitaxy