Journal
ACS NANO
Volume 3, Issue 7, Pages 1781-1788Publisher
AMER CHEMICAL SOC
DOI: 10.1021/nn900371t
Keywords
graphene; hydrogenation; plasma; Raman spectroscopy; X-ray photoelectron spectroscopy
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Funding
- National Research Foundation of Korea [2008-56529] Funding Source: Korea Institute of Science & Technology Information (KISTI), National Science & Technology Information Service (NTIS)
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In this work, graphene layers on SiO2/Si substrate have been chemically decorated by radio frequency hydrogen plasma. Hydrogen coverage investigation by Raman spectroscopy and micro-X-ray photoelectron spectroscopy characterization demonstrates that the hydrogenation of single layer graphene on SiO2/Si substrate is much less feasible than that of bilayer and multilayer graphene. Both the hydrogenation and dehydrogenation process of the graphene layers are controlled by the corresponding energy barriers, which show significant dependence on the number of layers. The extent of decorated carbon atoms in graphene layers can be manipulated reversibly up to the saturation coverage, which facilitates engineering of chemically decorated graphene with various functional groups via plasma techniques.
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