Journal
ACS NANO
Volume 3, Issue 6, Pages 1451-1456Publisher
AMER CHEMICAL SOC
DOI: 10.1021/nn9002924
Keywords
hierarchical pattern; block copolymer micelles; nanoparticles; stamp deformation
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Funding
- Alexander von Humboldt Foundation
- BMBF
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A simple and general patterning technique for inorganic nanoparticles (NPs, e.g., gold NPs) is demonstrated, consisting of the selective lift-off of metal precursor loaded block copolymer micelles. The procedure works as follows: first, a topographically micropatterned polystyrene (PS) stamp is placed in contact with a substrate covered with hexagonally arranged micelles. Then the assembly is heated above the glass transition temperature (T-g) of PS, and finally, the PS stamp is peeled off, removing from the substrate the micelles that were in contact with the protrusions of the stamp. As a result, patterns of micelles either exactly identical to the original or with much smaller features down to submicrometer were obtained. In a subsequent step, the organic material can be removed and the metal precursor reduced by plasma treatment, resulting in patterns of NPs. This technique, denoted as mu-contact deprinting, provides a fast and inexpensive way to obtain hierarchical patterns of NIPS on a wide range of substrates. It is demonstrated that it can even be applied on curved surfaces because of the softness of the PS stamp above its T-g.
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