Journal
ACS NANO
Volume 3, Issue 3, Pages 721-727Publisher
AMER CHEMICAL SOC
DOI: 10.1021/nn8008883
Keywords
silicon nanomembrane; Ge quantum dots; strain superlattice; minibands; Seebeck coefficient
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Funding
- U.S. Department of Energy, Office of Basic Energy Sciences [DE-FG02-03ER46028, DE-FG02-03ER46027]
- National Science Foundation [ECCS-0547415]
- Air Force Office of Scientific Research [FA9950-06-1-0472]
- NSF
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Significant new mechanical and electronic phenomena can arise in single-crystal semiconductors when their thickness reaches nanometer dimensions, where the two surfaces of the crystal are physically close enough to each other that what happens at one surface influences what happens at the other. We show experimentally that, in silicon nanomembranes, through-membrane elastic interactions cause the double-sided ordering of epitaxially grown nanostressors that locally and periodically highly strains the membrane, leading to a strain lattice. Because strain influences band structure, we create a periodic band gap modulation, up to 20% of the band gap, effectively an electronic superlattice. Our calculations demonstrate that discrete minibands can form in the potential wells of an electronic superlattice generated by Ge nanostressors on a sufficiently thin Si(001) nanomembrane at the temperature of 77 K. We predict that it is possible to observe discrete minibands in Si nanoribbons at room temperature if nanostressors of a different material are grown.
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