Journal
ACS NANO
Volume 3, Issue 1, Pages 53-58Publisher
AMER CHEMICAL SOC
DOI: 10.1021/nn800527m
Keywords
zinc oxide; nanowire array; pattern; photoresist; antireflection; graphite
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Funding
- Council of Hong Kong [N_HKUST615/06, 602305, 603006]
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Were port a simple and effective method for fabricating and patterning high-quality ZnO nanowire arrays using carbonized photoresists to control the nucleation site, density, and growth direction of the nanowires. The ZnO nanowires fabricated using this method show excellent alignment, crystal quality, and optical properties that are independent of the substrates. The carbonized photoresists provide perfect nucleation sites for the growth of aligned ZnO nanowires and they also perfectly connect to the nanowires to form ideal electrodes that can be used in many applications of ZnO nanomaterials.
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