Journal
ACS APPLIED MATERIALS & INTERFACES
Volume 6, Issue 21, Pages 18418-18422Publisher
AMER CHEMICAL SOC
DOI: 10.1021/am504892q
Keywords
atmospheric pressure plasma-initiated CVD; free-radical polymerization; char-forming coating; phosphorus-containing coatings; cotton fabrics
Funding
- Luxembourgish Fonds National de la Recherche (FNR) through FRCOATINGS
Ask authors/readers for more resources
An innovative atmospheric pressure chemical vapor deposition method toward the deposition of polymeric layers has been developed. This latter involves the use of a nanopulsed plasma discharge to initiate the free-radical polymerization of an allyl monomer containing phosphorus (diethylallylphosphate, DEAP) at atmospheric pressure. The polymeric structure of the film is evidence by mass spectrometry. The method, highly suitable for the treatment of natural biopolymer substrate, has been carried out on cotton textile to perform the deposition of an efficient and conformal protective coating.
Authors
I am an author on this paper
Click your name to claim this paper and add it to your profile.
Reviews
Recommended
No Data Available