Atmospheric Pressure Plasma-Initiated Chemical Vapor Deposition (AP-PiCVD) of Poly(diethylallylphosphate) Coating: A Char-Forming Protective Coating for Cellulosic Textile

An innovative atmospheric pressure chemical vapor deposition method toward the deposition of polymeric layers has been developed. This latter involves the use of a nanopulsed plasma discharge to initiate the free-radical polymerization of an allyl monomer containing phosphorus (diethylallylphosphate, DEAP) at atmospheric pressure. The polymeric structure of the film is evidence by mass spectrometry. The method, highly suitable for the treatment of natural biopolymer substrate, has been carried out on cotton textile to perform the deposition of an efficient and conformal protective coating.