Journal
ACS APPLIED MATERIALS & INTERFACES
Volume 5, Issue 11, Pages 4659-4666Publisher
AMER CHEMICAL SOC
DOI: 10.1021/am4006258
Keywords
tungsten oxide; Ti-doping; sputter-deposition; microstructure; optical constants
Funding
- National Science Foundation (NSF)
- NSF-PREM [DMR-1205302]
- NSF [NSF-DMR-0521650]
- Division Of Materials Research
- Direct For Mathematical & Physical Scien [1205302] Funding Source: National Science Foundation
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We report on the optical constants and their dispersion profiles determined from spectroscopic ellipsometry (SE) analysis of the 20%-titanium (Ti) doped of tungsten oxide (WO3) thin films grown by sputter-deposition. The Ti-doped WO3 films grown in a wide range of temperatures (25-500 degrees C) are amorphous and optically transparent. SE data indicates that there is no significant interdiffusion at the film substrate interface for a W Ti oxide film growth of similar to 90 nm. The index refraction (n) at lambda = 550 nm vary in the range of 2.17-2.31 with a gradual increase in growth temperature. A correlation between the growth conditions and optical constants is discussed.
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