4.8 Article

Optical Constants of Amorphous, Transparent Titanium-Doped Tungsten Oxide Thin Films

Journal

ACS APPLIED MATERIALS & INTERFACES
Volume 5, Issue 11, Pages 4659-4666

Publisher

AMER CHEMICAL SOC
DOI: 10.1021/am4006258

Keywords

tungsten oxide; Ti-doping; sputter-deposition; microstructure; optical constants

Funding

  1. National Science Foundation (NSF)
  2. NSF-PREM [DMR-1205302]
  3. NSF [NSF-DMR-0521650]
  4. Division Of Materials Research
  5. Direct For Mathematical & Physical Scien [1205302] Funding Source: National Science Foundation

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We report on the optical constants and their dispersion profiles determined from spectroscopic ellipsometry (SE) analysis of the 20%-titanium (Ti) doped of tungsten oxide (WO3) thin films grown by sputter-deposition. The Ti-doped WO3 films grown in a wide range of temperatures (25-500 degrees C) are amorphous and optically transparent. SE data indicates that there is no significant interdiffusion at the film substrate interface for a W Ti oxide film growth of similar to 90 nm. The index refraction (n) at lambda = 550 nm vary in the range of 2.17-2.31 with a gradual increase in growth temperature. A correlation between the growth conditions and optical constants is discussed.

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