Journal
ACS APPLIED MATERIALS & INTERFACES
Volume 4, Issue 8, Pages 3910-3915Publisher
AMER CHEMICAL SOC
DOI: 10.1021/am3007142
Keywords
ZnO nanorods; hydrothermal; nanosphere lithography; hydrophobic
Funding
- KIST [Gran 2E22121]
- National Research Foundation of Korea (NRF)
- Korea government (MEST) [2011-0013704]
- National Research Foundation of Korea [2011-0013704] Funding Source: Korea Institute of Science & Technology Information (KISTI), National Science & Technology Information Service (NTIS)
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Here we describe a simple, versatile technique to produce large-scale arrays of highly ordered ZnO nanorods. Patterning of three distinct ZnO crystal morphologies is demonstrated through use of different ZnO seed layers. Array formation is accomplished through a simple variation on nanosphere lithography that imprints a thickness variation across a PMMA mask layer. The area of exposed seed layer is controlled through etching time in an oxygen plasma. Subsequent hydrothermal growth from the patterned seed layer produces high-quality ZnO crystals in uniform arrays. The high uniformity of the patterned array is shown to induce a high contact angle hydrophobic state even without the need for chemical modification of the ZnO surface. This technique provides a straightforward way to integrate the optical and electrical properties of high-quality ZnO, nanorods with the tunable fluidic properties at the surface of well-ordered arrays.
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