Journal
ACS APPLIED MATERIALS & INTERFACES
Volume 3, Issue 12, Pages 4722-4729Publisher
AMER CHEMICAL SOC
DOI: 10.1021/am2011756
Keywords
wettability conversion; silicon nanowires; aqueous electroless etching; surface modification; UV illumination; superhydrophobic-hydrophilic pattern
Funding
- Converging Research Center through the Ministry of Education, Science and Technology [2011K000631]
- National Research Foundation of Korea (NRF)
- Ministry of Education, Science and Technology [2009-0093823]
- KARI-University Partnership program
- Korean government (MEST) [20110028594]
Ask authors/readers for more resources
We present a facile method to fabricate hydrophilic patterns in superhydrophobic Si nanowire (NW) arrays for guiding water droplets. The superhydrophobic Si NW arrays were obtained by simple dip-coating of dodecyltrichlorosilane (DTS). The water contact angles (CAs) of DTS-coated Si NW arrays drastically increased and saturated at the superhydrophobic regime (water CA >= 150 degrees) as the lengths of NW's increased. The demonstrated superhydrophobic surfaces show an extreme water repellent property and small CA hysteresis of less than 7 degrees, which enable the water droplets to easily roll off. The wettability of the DTS-coated Si NW arrays can be converted from superhydrophobic to hydrophilic via UV-enhanced photodecomposition of the DTS, and such wettability conversion was reproducible on the same surfaces by repeating the DTS coating and photodecomposition processes. The resulting water guiding tracks were successfully demonstrated via selective patterning of the hydrophilic region on superhydrophobic Si NW arrays, which could enable water droplets to move along defined trajectories.
Authors
I am an author on this paper
Click your name to claim this paper and add it to your profile.
Reviews
Recommended
No Data Available