Journal
ACS APPLIED MATERIALS & INTERFACES
Volume 2, Issue 4, Pages 1200-1205Publisher
AMER CHEMICAL SOC
DOI: 10.1021/am100035d
Keywords
pattern; binary polymer brushes; surface-initiated photopolymerization (SIPP)
Funding
- National Natural Science Foundation of China [50803036]
- Science & Technology Commission of Shanghai Municipal Government [08520704700]
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Taking advantage of the photobleaching and co-initiating properties of the dendritic thioxanthone (TX) photoinitiator, we developed a general and facile approach to fabricate patterned binary polymer brushes by combining photolithography and surface-initiated photopolymerization (SIPP). The dendritic TX photoinitiator monolayer was immobilized covalently on a silicon slide surface, followed by photobleaching through a mask. The resulting slides could initiate photopolymerization of methyl methacrylate (MMA) to generate a patterned poly (methyl methacrylate) (PMMA) brush, and subsequently initiate styrene (St) in the presence of TX to obtain patterned binary poly (methyl methacrylate)-polystyrene (PMMA-PS) brushes. This general and facile method could be of use in large-scale patterned binary polymer brush fabrication.
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