Journal
ACS APPLIED MATERIALS & INTERFACES
Volume 2, Issue 3, Pages 913-918Publisher
AMER CHEMICAL SOC
DOI: 10.1021/am9008677
Keywords
LCD-TFT passivation layer; low k; high transparency; solution-based process; organic-inorganic hybrid material
Funding
- Ministry of Education, Science and Technology [R11-2007-045-03002-0(2009), R01-2007-000-20815-0(2009)]
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Photocurable and highly condensed fluorinated methacrylate oligosiloxane, with a low dielectric constant (k = 2,54), was prepared by a nonhydrolytic sol-gel condensation reaction. The oligosiloxane resin was then spin-coated, photocured, and thermally baked in order to fabricate a fluorinated methacrylate hybrid material (FM hybrimer) thin him. This study investigated the application of this FM hybrimer film as a low-k passivation layer in LCD-based thin film transistors (TFT). It was found that a dielectric constant as low as k = 2.54 could be obtained, without introducing pores in the dense FM hybrimer films. This study compares FM hybrimer film characteristics with those required for passivation layers in LCD-TFTs, including thermal stability, optical transmittance, hydrophobicity, gap fill, and planarization effects as well as electrical insulation.
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