Journal
ACS APPLIED MATERIALS & INTERFACES
Volume 2, Issue 11, Pages 3111-3118Publisher
AMER CHEMICAL SOC
DOI: 10.1021/am100608k
Keywords
Colloidal lithography; polymer brush; adhesion
Funding
- University of Akron
- China Scholarship Council (CSC)
- Office of Research Services and Sponsored Programs of the University of Akron
- National Science Foundation [CHE-9977144]
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A general method has been developed for transferring interfacially trapped submonolayer hexagonal arrays of silica particles for nano and mesoscopic surface patterning. Poly(n-butyl acrylate) and poly(n-butyl acrylate-random-N,N-diethylaminoethyl acrylate) brushes were grafted on the substrates via the graft from method using atom transfer radical polymerization. The polymer brush served as an adhesive promoter between the particles and the substrates and proved to be effective for locking the particles in the hexagonal lattice against the lateral capillary force arising from a thin layer of water attached to the surface of the substrate. Several parameters that influence preservation of the order of the particle arrays were examined. These include brush thickness, brush composition, interparticle distance, and particle diameter.
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