Journal
ACS APPLIED MATERIALS & INTERFACES
Volume 1, Issue 4, Pages 746-749Publisher
AMER CHEMICAL SOC
DOI: 10.1021/am900018j
Keywords
patterning; metal nanoparticles; mesoporous films; UV lithography; photodeposition
Funding
- CONICET [PIP 5191]
- ANPCyT [34518, 00335, 22711]
- UNSAM
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A simple method that allows selective positioning of nanoparticles into mesoporous monolayer or multilayer thin films is presented. This technique applies UV lithography in order to bring about in situ light-induced reduction of silver in templated cavities of TiO2. The nanoparticle lithography presented here provides a novel approach to hierarchical lithography patterning for multifunctional devices.
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