Journal
ADVANCED ENGINEERING MATERIALS, PTS 1-3
Volume 194-196, Issue -, Pages 2400-2403Publisher
TRANS TECH PUBLICATIONS LTD
DOI: 10.4028/www.scientific.net/AMR.194-196.2400
Keywords
Thermoelectric Thin Film; Antimony Telluride; Magnetron Sputtering; Co-Sputtering
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Antimony and tellurium were deposited on K9 glass via direct current and radio frequency magnetron co-sputtering. Antimony telluride thermoelectric thin films were simultaneously synthesized without post treatment. The influence of the sputtering power of Te and annealing of Sb-Te fabricated by magnetron sputtering were investigated. The maximum Seebeck coefficient of Sb-Te film was 212 mu V/K which was obtained at the sputtering power of Sb 4W and Te 60W separately. When annealed at 300 C, the electrical resistivity and Seebeck coefficient of the film are 6.67x10(4) S/m and 119 mu V/K. The power factor increased to the highest value of 9.4x 10(-4) W/mK(2) from 4x10(-5) W/mK(2) after post treatment of the as-deposited film.
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