4.8 Article

Synthesis of Large-Area Highly Crystalline Monolayer Molybdenum Disulfide with Tunable Grain Size in a H2 Atmosphere

Journal

ACS APPLIED MATERIALS & INTERFACES
Volume 7, Issue 40, Pages 22587-22593

Publisher

AMER CHEMICAL SOC
DOI: 10.1021/acsami.5b07038

Keywords

molybdenum disulfide; highly crystalline; grain size; H-2; scanning microwave microscopy

Funding

  1. National Natural Science Foundation of China [61274113, 11204212, 61404091]
  2. Program for New Century Excellent Talents in University [NCET-11-1064]
  3. Tianjin Natural Science Foundation [13JCYBJC15700, 13JCZDJC26100, 14JCZDJC31500, 14JCQNJC00800]
  4. Tianjin Science and Technology Developmental Funds of Universities and Colleges [20100703, 20130701, 20130702]
  5. Directorate For Engineering
  6. Div Of Electrical, Commun & Cyber Sys [1542152] Funding Source: National Science Foundation

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Large-area and highly crystalline monolayer molybdenum disulfide (MoS2) with a tunable grain size was synthesized in a H-2 atmosphere. The influence of introduced H-2 on MoS2 growth and grain size, as well as the corresponding mechanism, was tentatively explored by controlling the H-2 flow rate. The as-grown monolayer MoS2 displays excellent uniformity and high crystallinity evidenced by Raman and high-resolution transmission electron microscopy. The Raman results also give an indication that the quality of the monolayer MoS2 synthesized in a H-2 atmosphere is comparable to that synthesized by using seed or mechanical exfoliation. In addition, the electronic properties and dielectric inhomogeneity of MoS2 monolayers were also detected in situ via scanning microwave microscopy, with measurements on impedance and differential capacitance (dC/dV). Back-gated field-effect transistors based on highly crystalline monolayer MoS2 shows a field-effect mobility of similar to 13.07 cm(2) V-1 s(-1) and an I-on/I-off ratio of similar to 1.1 x 10(7), indicating that the synthesis of large-area and high-quality monolayer MoS2 with H-2 is a viable method for electronic and optoelectronic applications.

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