4.4 Article

Design and Characterization of a Silicon Photomultiplier in 0.35-μm CMOS

Journal

IEEE JOURNAL OF THE ELECTRON DEVICES SOCIETY
Volume 6, Issue 1, Pages 74-80

Publisher

IEEE-INST ELECTRICAL ELECTRONICS ENGINEERS INC
DOI: 10.1109/JEDS.2017.2771145

Keywords

Silicon photomultiplier (SiPM); avalanche breakdown structures; CMOS

Ask authors/readers for more resources

The possibility to design a silicon photomultiplier (SiPM) using standard CMOS processes represents the frontier of current low photon flux detectors. It allows an integrated development of both sensor and intelligent read-out electronics on the same technology line and enables to create intelligent devices with on-chip signal processing. We report the design and characterization of an SiPM composed of 20 x 20 microcells with size 50 x 50 mu m(2). The device exhibits 200-kHz/mm(2) dark rate, 10% cross talk probability, 1.5% afterpulsing probability, and 5.35 x 10(6) intrinsic gain at 29-V operational voltage. It is obtained at a 0.35-mu m CMOS technology node, which is compatible with the development of integrated electronics. In order to verify the potential application of the device to optical and radiation detection systems, we measure its photon detection efficiency and its response to LED light and scintillation light from an LySO crystal.

Authors

I am an author on this paper
Click your name to claim this paper and add it to your profile.

Reviews

Primary Rating

4.4
Not enough ratings

Secondary Ratings

Novelty
-
Significance
-
Scientific rigor
-
Rate this paper

Recommended

No Data Available
No Data Available