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Nonlinear optics on silicon-rich nitride-a high nonlinear figure of merit CMOS platform [Invited]

Journal

PHOTONICS RESEARCH
Volume 6, Issue 5, Pages B50-B66

Publisher

OPTICAL SOC AMER
DOI: 10.1364/PRJ.6.000B50

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Funding

  1. MOE
  2. National Research Foundation
  3. National Research Foundation Land and Liveability National Innovation Challenge Grant
  4. SUTD-MIT International Design Center
  5. Temasek Laboratories grant
  6. National Research Foundation, Prime Minister's Office, Singapore under Medium Sized Centre Program

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CMOS platforms with a high nonlinear figure of merit are highly sought after for high photonic quantum efficiencies, enabling functionalities not possible from purely linear effects and ease of integration with CMOS electronics. Silicon-based platforms have been prolific amongst the suite of advanced nonlinear optical signal processes demonstrated to date. These include crystalline silicon, amorphous silicon, Hydex glass, and stoichiometric silicon nitride. Residing between stoichiometric silicon nitride and amorphous silicon in composition, silicon-rich nitride films of various formulations have emerged recently as promising nonlinear platforms for high nonlinear figure of merit nonlinear optics. Silicon-rich nitride films are compositionally engineered to create bandgaps that are sufficiently large to eliminate two-photon absorption at telecommunications wavelengths while enabling much larger nonlinear waveguide parameters (5x-500x) than those in stoichiometric silicon nitride. This paper reviews recent developments in the field of nonlinear optics using silicon-rich nitride platforms, as well as the outlook and future opportunities in this burgeoning field. (C) 2018 Chinese Laser Press

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