Journal
ATOMIC LAYER DEPOSITION APPLICATIONS 7
Volume 41, Issue 2, Pages 321-330Publisher
ELECTROCHEMICAL SOC INC
DOI: 10.1149/1.3633683
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Funding
- Research Program of the Materials innovation institute M2i [MC3.06278]
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One of the remaining challenges in the field of portable electronics is the miniaturization of lithium-ion batteries without decreasing their storage capacity. To tackle this challenge and to effectively integrate battery technology in even a wider variety of applications, it is essential to produce high quality thin films for all-solid-state batteries. A remote plasma ALD process for the positive electrode material LiCoO2 was developed using the combination of CoCp2 as the cobalt precursor, (LiOBu)-Bu-t as the lithium precursor and O-2 plasma as the oxidant source. The thin films were deposited at a temperature of 325 degrees C with a virtually linear growth rate of 0.06 nm/cycle. After annealing the samples at 700 degrees C for 6 minutes the high temperature phase LiCoO2 was obtained, as demonstrated by XRD and Raman spectroscopy measurements. Electrochemical charge/discharge cycling showed good electrochemical activity with a promising storage capacity.
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