4.8 Article

Direct-gap semiconducting tri-layer silicene with 29% photovoltaic efficiency

Journal

NANO ENERGY
Volume 51, Issue -, Pages 489-495

Publisher

ELSEVIER
DOI: 10.1016/j.nanoen.2018.06.079

Keywords

Multi-layer silicene; Photovoltaic materials; Direct band gap; Thin-film solar cell

Funding

  1. National Natural Science Foundation of China [11774127, 11534003, 11764043]
  2. National Key Research and Development Program of China [2016YFB0201200, 2016YFB0201201, 2017YFB0701503]
  3. Program for JLU Science and Technology Innovative Research Team (JLUSTIRT)
  4. Science Challenge Project [TZ2016001]
  5. NSF-CREST Center for Innovation, Research and Education in Environmental Nanotechnology (CIRE2N) [HRD-1736093]
  6. NASA [17-EPSCoRProp-0032]

Ask authors/readers for more resources

Crystalline silicon is dominating the current solar cell market due to the significant efficiency improvement and cost reduction in last decades. However, its indirect band gap nature leads to inefficient visible-light absorption, which seriously impedes further performance enhancement in silicon-based photovoltaic devices. Thus, it is highly desirable to develop direct band gap silicon materials. Herein, by means of ab initio swarm-intelligence structure-searching method, we predicted a quasi-direct gap semiconducting tri-layer silicene structure consisting of alternating arrays of six-membered Si rings, which can be converted into a direct gap semiconductor of 0.86 eV by applying a low tensile strain (similar to 2.5%). Our calculations revealed that the photovoltaic efficiency of the tri-layer silicene reaches 29% at 1.0 mu m, which is comparable to that of bulk GaAs with the highest conversion efficiency among thin-film solar cell absorbers.

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