4.6 Article

High-performance flexible oxide TFTs: optimization of a-IGZO film by modulating the voltage waveform of pulse DC magnetron sputtering without post treatment

Journal

JOURNAL OF MATERIALS CHEMISTRY C
Volume 6, Issue 10, Pages 2522-2532

Publisher

ROYAL SOC CHEMISTRY
DOI: 10.1039/c7tc04970f

Keywords

-

Funding

  1. National Key R&D Program of China [2016YFB0401504]
  2. NSFC [51771074, U1601651]
  3. National Key Basic Research and Development Program of China (973 program) - MOST [2015CB655004]
  4. Guangdong Natural Science Foundation [2016A030313459, 2017A030310028]
  5. Science and Technology Project of Guangdong Province [2014B090915004, 2016B090907001]
  6. Project for Guangdong Province Universities and the Colleges Pearl River Scholar Funded Scheme

Ask authors/readers for more resources

We propose a facile and scalable approach to fabricate high performance flexible a-IGZO thin film transistors (TFTs) by adopting the waveform modulation of pulse DC magnetron sputtering (PDCMS) to rationally optimize the film quality of semiconductors without post treatment. The voltage waveform was modulated by rationally altering the frequency and duty cycles, and, consequently, an optimum film quality of a-IGZO film was obtained that resulted in the outstanding performance of the flexile oxide TFTs. A series of characterizations (TEM, XRR AFM, XPS, mu-PCD etc.) were carried out to understand the mechanism of a-IGZO semiconductor film growth. The flexible TFT with an optimum a-IGZO film exhibited a mobility (mu(sat)) of 20.9 cm(2) V-1 s(-1) and good stability under bending strain. This work provides an alternative approach to fabricate high performance flexible a-IGZO TFTs on an industrial scale.

Authors

I am an author on this paper
Click your name to claim this paper and add it to your profile.

Reviews

Primary Rating

4.6
Not enough ratings

Secondary Ratings

Novelty
-
Significance
-
Scientific rigor
-
Rate this paper

Recommended

No Data Available
No Data Available