CRITICAL DETONATION THICKNESS IN VAPOR-DEPOSITED PENTAERYTHRITOL TETRANITRATE (PETN) FILMS

The use of physical vapor deposition is an attractive technique to produce microenergetic samples to study sub-millimeter explosive behavior. Films of the high explosive PETN (pentaerythritol tetranitrate) were deposited through vacuum thermal sublimation. Deposition conditions were varied to understand the effect of substrate cooling capacity and substrate temperature during deposition. PETN films were characterized with surface profilometry and scanning electron microscopy. Detonation velocity versus PETN film thickness was analyzed using a variation of the standard form for analysis of the diameter effect. Results were compared with previous work conducted on PETN films deposited with lower substrate cooling capacity. Seemingly subtle variations in PETN deposition conditions led to differences in detonation behaviors such as critical thickness for detonation, detonation velocity at infinite thickness, and the shape of the critical thickness curves.