Journal
METAMATERIALS VII
Volume 8423, Issue -, Pages -Publisher
SPIE-INT SOC OPTICAL ENGINEERING
DOI: 10.1117/12.922750
Keywords
nanoimprint lithography; split ring resonators; metamaterials; high resolution
Ask authors/readers for more resources
We report on the fabrication of 70 nm wide, high resolution rectangular U-shaped split ring resonators (SRRs) using nanoimprint lithography (NIL). The fabrication method for the nanoimprint stamp does not require dry etching. The stamp is used to pattern SRRs in a thin PMMA layer followed by metal deposition and lift-off. Nanoimprinting in this way allows high resolution patterns with a minimum feature size of 20 nm. This fabrication technique yields a much higher throughput than conventional e-beam lithography and each stamp can be used numerous times to imprint patterns. Reflectance measurements of fabricated aluminium SRRs on silicon substrates show a so-called an LC resonance peak in the visible spectrum under transverse electric polarisation. Fabricating the SRRs by NIL rather than electron beam lithography allows them to be scaled to smaller dimensions without any significant loss in resolution, partly because pattern expansion caused by backscattered electrons and the proximity effect are not present with NIL. This in turn helps to shift the magnetic response to short wavelengths while still retaining a distinct LC peak.
Authors
I am an author on this paper
Click your name to claim this paper and add it to your profile.
Reviews
Recommended
No Data Available