Journal
SMALL
Volume 14, Issue 29, Pages -Publisher
WILEY-V C H VERLAG GMBH
DOI: 10.1002/smll.201801346
Keywords
grain size; graphene films; phonon transfer; thermal conductivity; turbostratic-stacking
Categories
Funding
- Swedish Foundation for Strategic Research (SSF) [SE13-0061, GMT14-0045]
- Swedish National Board for Innovation (Vinnova) Graphene SIO-Agenda Program
- Formas program on graphene enhanced composite
- Production Area of Advance at Chalmers University of Technology, Sweden
- Ministry of Science and Technology of China [2017YFB0406000]
- Shanghai Municipal Education Commission (Shanghai University High Education Peak Discipline Program)
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Due to substantial phonon scattering induced by various structural defects, the in-plane thermal conductivity (K) of graphene films (GFs) is still inferior to the commercial pyrolytic graphite sheet (PGS). Here, the problem is solved by engineering the structures of GFs in the aspects of grain size, film alignment, and thickness, and interlayer binding energy. The maximum K of GFs reaches to 3200 W m(-1) K-1 and outperforms PGS by 60%. The superior K of GFs is strongly related to its large and intact grains, which are over four times larger than the best PGS. The large smooth features about 11 mu m and good layer alignment of GFs also benefit on reducing phonon scattering induced by wrinkles/defects. In addition, the presence of substantial turbostratic-stacking graphene is found up to 37% in thin GFs. The lacking of order in turbostratic-stacking graphene leads to very weak interlayer binding energy, which can significantly decrease the phonon interfacial scattering. The GFs also demonstrate excellent flexibility and high tensile strength, which is about three times higher than PGS. Therefore, GFs with optimized structures and properties show great potentials in thermal management of form-factor-driven electronics and other high-power-driven systems.
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